데이터베이스연구회

□ 사례 20 - 플라즈마 디스플레이 패널의 전극 형성 방법 - ▶분야 : 전기전자(반도체) ▶기술내용 : 버스전극과 블랙 매트릭스가 정확하게 중첩되지 않고 블랙 매트릭스 외부에 버스 전극이 형성되는 문제를 음극판 위에 블랙 매트릭스와 전극을 미리 형 후 유리기판위에 옮김으로써 문제점을 개선 ▶title ○작성내용 : method for making electrode of plasma display panel capable of forming simultaneously black matrix and bus electrode on upper glass substrate ○수정내용 : method for making electrode of plasma display panel capable of forming bus electrode right on black matrix to accurately overlap ·capable of forming bus electrode right on black matrix to accurately overlap 버스 전극을 블랙 매트릭스위에 정확히 중첩되게 형성하는 것이 중요 ▶purpose ○작성내용 : a method for making an electrode of a plasma display panel is provided to simplify an upper substrate manufacturing process of the plasma display panel by forming simultaneously a black matrix and a bus electrode on an upper glass substrate. ○수정내용 : a method for making an electrode of a plasma display panel is provided to form a bus electrode right on a black matrix to overlap by forming a combination structure comprised of the bus electrode and the black matrix on a cathode x-frame firstly and then printing the combination structure on a substrate. ·버스 전극과 블랙 매트릭스 결합 구조물 형성은, 도전성 전극 조성물을 블레이딩 한후, 새도우 마스크를 붙이고 블랙 매트릭스 용액을 주입한 후 다시 블레이딩하여 형성되는 핵심사항은 기재하지 않고, 단지 조성물의 주입과 블레이딩 처리로 모든 과정을 설명 ·용어: photo-matrix solution -> black matrix solution, blading electrode compositions -> blading conductive electrode materials (도전성 적극 구성물) ▶constitution ○작성내용 : a combination structure of an electrode and a black matrix overlapped on the electrode is formed on an upper surface of a cathode x-frame. the combination structure is printed on a substrate in order to form simultaneously the combination structure of the black matrix and the electrode. a method for forming the combination structure of the black matrix and the electrode includes a process for implanting and blading electrode compositions into the cathode x-frame and a process for attaching a shadow mask and implanting and blading a photo-matrix solution. ○수정내용 : an upper electrode(110) and a lower electrode(120) are formed inside a vacuum chamber(100). a self dc bias voltage is applied to one of the upper electrode and the lower electrode by rf power. opposing electrodes are grounded in the vacuum chamber. an opposing surface(111) of the ground electrode facing the electrode for receiving the self dc bias voltage is formed with a concavo-convex surface(112). the ground electrode is formed with one or more electrodes. ·상하부전극을 진공챔버에 형성하는 것이 아니라 배치를 하는 것임 ·an upper electrode(110) and a lower electrode(120) are formed inside a vacuum chambe -> an upper electrode(110) and a lower electrode(120) are placed in a vacuum chamber