생산기술특허연구회

"Recently, FIB-CVD process has been applied to the micro-manufacturing field such as semi-conductor industry, display industry and IT industry etc. because it is available to fabricate 3D shape of micro structure directly and more effective than any other machining processes in a point of view of the minimum feature size. In this paper, to analyze the FIB-CVD mechanism, we suggested two models relating to the concentration effect of the radical of the precursor and the effect of the physical self-bias potential energy difference of the radical. And we give the conclusion on discussion of the FIB-CVD mechanism suggested and the characteristics of FIB-CVD according m two models through some experiments. Next, we tried to get more effective conditions for improving the deposition yield and minimizing the pattern width. Using the Taguchi method, dwell time could be found as the dominant parameter. Experiments for minimizing the pattern width were carried out. Finally, some remarks about these results were discussed." 더자세한 내용은 첨부파일 참조